High-Precision (PP) Melt-Blown Deep Filter Cartridge for Chemical Mechanical Polishing (CMP)

‌Working Principle


This filter cartridge is specifically designed for filtering in chemical mechanical polishing (CMP) applications. It effectively removes agglomerated particles and colloids from CMP slurry while retaining the necessary abrasive particles to maintain the slurry's particle size distribution. Featuring a unique patented composite structure, the cartridge incorporates a gradient pore deep polypropylene filter medium, with an outer layer of continuous melt-blown material and an inner layer of nanofiber membrane, providing outstanding filtration efficiency.



Features


Large Gradient Structured Design: Ensures excellent filtration efficiency and maximizes service life.


Ultra-Fine Fiber Structure: Effectively traps larger particles to prevent scratching while retaining essential abrasive particles.

Low Leachables: Made from pure PP material without surfactants or adhesives, ensuring minimal leachables.

Extended Service Life: Longer lifespan contributes to reduced overall costs.

Applications

The high-precision melt-blown filter cartridge is ideal for:

Semiconductor Manufacturing: Filtering polishing liquids during CMP processes to ensure product quality.


Optical Industry: Providing high-precision filtration in optical component processing.

Other High-Tech Industries: Situations requiring stringent control over particle contamination.