High-Flux (PP) Melt-Blown Deep Filter Cartridge for Chemical Mechanical Polishing (CMP)

‌Working Principle


The deep filter cartridge features a composite polypropylene filter medium specifically designed for filtering in CMP slurry delivery systems. Its unique gradient design and conical pore structure achieve an excellent balance between high particle interception efficiency and large contaminant capacity. This effectively removes larger particles from CMP slurry while maintaining the unchanged particle size distribution before and after filtration.




Features


Gradient Filtration Structure: Ensures superior filtration efficiency.


Significant Particle Removal Rate: Sharp efficiency curve enhances the removal of larger particles while minimizing the loss of effective particles.

Optimized Service Life: Reduces overall operational costs.

Low Leachables: No surfactants or adhesives added during manufacturing, ensuring minimal leachables.




Applications


This high-flux melt-blown filter cartridge is widely used in:


Semiconductor Industry: In oxide CMP, shallow trench isolation CMP, and metal interconnect CMP.


Optical Manufacturing: For precision grinding filtration of optical components.

Other High-Tech Manufacturing: Suitable for industries requiring strict particle control.